Reflection type projection optical system and the reflection type projection optical system exposure apparatus provided with a

摘要

PPROBLEM TO BE SOLVED: To provide a reflection type projection optical system in which good reflection characteristics are provided even for X-rays, an increase in the sizes of reflection mirrors is suppressed and aberration correction is properly conducted. PSOLUTION: The reflection type projection optical system is provided with eight reflection mirrors and a reduced size image of a first surface (4) is formed on a second surface (7). The following reflection mirrors are provided for the optical system in the order of incident light beams from the first surface side, i.e., a concave first reflection mirror M1, a second reflection mirror M2 which has a convex surface and an aperture diaphragm AS, a concave third reflection mirror M3, a concave fourth reflection mirror M4, a concave fifth reflection mirror M5, a sixth reflection mirror M6, a convex seventh reflection mirror M7 and a concave eighth reflection mirror M8. PCOPYRIGHT: (C)2006,JPO&NCIPI