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Diode array architecture for handling nanoscale resistive memory array

机译:用于处理纳米级电阻式存储器阵列的二极管阵列架构

摘要

This memory constitution to be connected, the 1st conductor (BL) with, the 2nd conductor (WL) with, the 2nd conductor (WL) the resistant memory cell which is connected (130) with, resistant memory cell (130) and the 1st conductor (BL) at the same time, resistant memory cell (130) from the 1st conductor (BL) to the 1st diode which orientation is done (134) with, the 1st diode (134) with in parallel, resistant memory cell (130) and the 1st conductor (BL) to be connected by forward direction, at the same time, resistant memory cell (130) from the 1st conductor (BL) to the 2nd diode which orientation is done (132) with it includes in opposite direction. The 1st and 2nd diode (134 and 132) it possesses the threshold voltage which differs.
机译:该存储器结构是将第一导体(BL)与第二导体(WL),第二导体(WL)与电阻存储单元(130)连接的电阻存储单元(130)和第一连接的。同时,从第一导体(BL)到第一二极管(134)的电阻存储单元(130)与第一二极管(134)并联,电阻存储单元(130) )和要沿正向连接的第一导体(BL),同时,从第一导体(BL)到第二二极管的电阻存储单元(130)包括相反方向的取向(132) 。第一和第二二极管(134和132)具有不同的阈值电压。

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