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首页> 外文期刊>Advanced Functional Materials >32×32 Crossbar Array Resistive Memory Composed of a Stacked Schottky Diode and Unipolar Resistive Memory
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32×32 Crossbar Array Resistive Memory Composed of a Stacked Schottky Diode and Unipolar Resistive Memory

机译:由堆叠肖特基二极管和单极电阻存储器组成的32×32交叉开关阵列电阻存储器

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摘要

Various array types of 1-diode and 1-resistor stacked crossbar array (1D1R CA) devices composed of a Schottky diode (SD) (Pt/TiO_2/Ti/Pt) and a resistive switching (RS) memory cell (Pt/TiO_2/Pt) are fabricated and their performances are investigated. The unit cell of the 1 D1 R CA device shows high RS resistance ratio (≈10~3 at 1.5 V) between low and high resistance state (LRS and HRS), and high rectification ratio (≈10~5) between LRS and reverse-state SD. It also shows a short RS time of <50 ns for SET (resistance transition from HRS to LRS), and ≈600 ns for RESET (resistance transition from LRS to HRS), as well as stable RS endurance and data retention characteristics. It is experimentally confirmed that the selected unit cell in HRS (logically the "off" state) is stably readable when it is surrounded by unselected LRS (logically the "on" state) cells, in an array of up to 32 ×32 cells. The SD, as a highly non-linear resistor, appropriately controls the conducting path formation during the switching and protects the memory element from the noise during retention.
机译:由肖特基二极管(SD)(Pt / TiO_2 / Ti / Pt)和电阻开关(RS)存储单元(Pt / TiO_2 /)组成的各种类型的1二极管和1电阻堆叠式交叉开关阵列(1D1R CA)器件Pt)被制造并研究其性能。 1 D1 R CA器件的晶胞在低电阻状态和高电阻状态(LRS和HRS)之间显示出较高的RS电阻比(在1.5 V时约为10〜3),在LRS和反向之间显示出高的整流比(≈10〜5)。状态SD。它还显示SET的<50 ns短RS时间(从HRS到LRS的电阻转换)和RESET的≈600ns(从LRS到HRS的电阻转换),以及稳定的RS耐久性和数据保留特性。实验证实,处于HRS(逻辑上为“关闭”状态)的选定单位单元被未选择的LRS(逻辑上为“开启”状态)单元所包围时,可以稳定地读取(最多32×32单元)。 SD作为高度非线性的电阻器,可以在开关期间适当地控制导电路径的形成,并保护存储元件免受保持期间的噪声的影响。

著录项

  • 来源
    《Advanced Functional Materials》 |2013年第11期|1440-1449|共10页
  • 作者单位

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

    Department of Materials Engineering Hanyang University Ansan, 426-791, Korea;

    WCU Hybrid Materials Program Department of Materials Science and Engineering and Inter-university Semiconductor Research Center Seoul National University Seoul 151-744, Korea;

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