Method of determining a process parameter value based on scatterometry measurement data

摘要

The method according to one embodiment, a set of marker plurality of structures disposed on one calibration substrate, to obtain a calibration measurement data by optical detection devices. Was generated using known values ​​of different process parameters, the set of each marker structure includes a calibration marker at least one structure. The method includes the steps of obtaining measurement data using the optical detector from the marker at least one structure which is provided on a substrate is exposed with the unknown values ​​of the process parameters, the known value of the process parameter and a step of determining the unknown values ​​of the process parameters from the measurement data obtained by using the regression coefficients in the model based on the calibration measurement data.