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After making the suffering evaluation water the containment container of the semiconductor

机译:经过痛苦评估后,将半导体的容纳容器

摘要

PROBLEM TO BE SOLVED: To be able to attach microdose impurities which has a possibility of affecting harm influence to a semiconductor substrate property on the surface of the semiconductor substrate, by internally containing a piece of the semiconductor substrate, purifying the semiconductor surface while containing and making liquid to be evaluated to contact with the semiconductor surface.;SOLUTION: A supporting vessel for a semiconductor substrate is used for an evaluation method for liquid quality in which impurities in the liquid to be evaluated are detected or measured by analyzing the substrate surface after the liquid to be evaluated is contacted with the semiconductor substrate surface. The vessel is provided with a supporting means 24 which internally contains and supports the semiconductor substrate W, a draining port 22 which drains the liquid to be evaluated, and a cleaning liquid supplying means 14 for purifying the semiconductor substrate surface.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:通过在内部容纳一块半导体衬底,在容纳半导体颗粒的同时净化半导体表面,从而能够在半导体衬底的表面上附着可能影响对半导体衬底性能的有害影响的微剂量杂质。解决方案:用于半导体基板的支撑容器用于液体质量的评估方法,该方法通过分析基板表面后检测或测量被评估液体中的杂质待评价的液体与半导体衬底表面接触。该容器设置有在内部容纳并支撑半导体衬底W的支撑装置24,用于排放待评价液体的排出口22以及用于净化半导体衬底表面的清洁液供应装置14。版权所有:(C日本特许厅

著录项

  • 公开/公告号JP4487364B2

    专利类型

  • 公开/公告日2010-06-23

    原文格式PDF

  • 申请/专利权人 栗田工業株式会社;

    申请/专利号JP20000047366

  • 发明设计人 益戸 光和;水庭 哲夫;

    申请日2000-02-24

  • 分类号H01L21/66;G01N1/28;G01N1/36;G01N33/18;

  • 国家 JP

  • 入库时间 2022-08-21 18:59:53

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