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After making the suffering evaluation water the containment container of the semiconductor
After making the suffering evaluation water the containment container of the semiconductor
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机译:经过痛苦评估后,将半导体的容纳容器
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摘要
PROBLEM TO BE SOLVED: To be able to attach microdose impurities which has a possibility of affecting harm influence to a semiconductor substrate property on the surface of the semiconductor substrate, by internally containing a piece of the semiconductor substrate, purifying the semiconductor surface while containing and making liquid to be evaluated to contact with the semiconductor surface.;SOLUTION: A supporting vessel for a semiconductor substrate is used for an evaluation method for liquid quality in which impurities in the liquid to be evaluated are detected or measured by analyzing the substrate surface after the liquid to be evaluated is contacted with the semiconductor substrate surface. The vessel is provided with a supporting means 24 which internally contains and supports the semiconductor substrate W, a draining port 22 which drains the liquid to be evaluated, and a cleaning liquid supplying means 14 for purifying the semiconductor substrate surface.;COPYRIGHT: (C)2001,JPO
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