PROBLEM TO BE SOLVED: To provide a novel imprinting method enabling a high throughput to be realized.;SOLUTION: The imprinting method for transcribing an imprinting pattern formed on a mold on a pattern transcript on a substrate comprises contacting the pattern transcript with the imprinting pattern, extending a contact area of the imprinting pattern and the pattern transcript by applying a first pressure between the mold and the substrate, and controlling the positional relationship between the mold and the substrate by applying a second pressure lower than the first pressure.;COPYRIGHT: (C)2007,JPO&INPIT
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