Ion beam implanter, the energy measuring device of the ion beam, and a method of measuring the average kinetic energy of the ions

摘要

PROBLEM TO BE SOLVED: To provide a flight time energy measuring device for measuring and controlling ion beam energy and an ion implantation device including the measuring device.;SOLUTION: An ion implantation system includes an ion source, an ion accelerator and a beam forming and beam directing device, and an ion beam 14 constitutes a series of ion pulses having a preset frequency. An energy measuring device 200 has first and the second sensors 210 and 220, a timing circuit 204 and a conversion circuit 206 for measuring the mean ion kinetic energy. When an ion beam 14 passes each of the sensors 210 and 220, a signal is generated therefrom and the timing circuit 204 determines a time elapsed for selected ion pulses to travel along the distance between the first and the second sensors 210 and 220. In addition, the timing circuit 204 calculates the mean number of ion pulses for finding an offset time. The conversion circuit 206 converts the elapsed time to the measurement value of ion beam energy.;COPYRIGHT: (C)2000,JPO