The sputtering target for the oxidation film formation being the sputtering target for the oxidation film formation which consists of the Nb

摘要

PROBLEM TO BE SOLVED: To provide a sputtering target with which the production efficiency of an Nb oxide film and eventually an optical thin film etc., can be enhanced by improving the deposition rate of the Nb oxide film when the Nb oxide film appropriate for the optical thin film is deposited by sputtering.;SOLUTION: The sputtering target is composed of an Nb material. The Nb material constituting the sputtering target contains hydrogen of a range from 1 to 1,000 ppm. Further, the variation in the hydrogen content over the entire part of the target is confined to ≤20%.;COPYRIGHT: (C)2005,JPO&NCIPI