WET-ETCHING JIG AND WET-ETCHING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a wet-etching jig and a wet-etching apparatus which can reduce etching variations due to hydrogen bubbles in an etching processing.;SOLUTION: A wet-etching jig 3 holds a substrate 11 in which etching is carried out by immersing in an alkaline liquid 2. The jig 3 has a wiper 13, which removes bubbles 16 on the surface of the substrate 11 by being relatively moved to the surface of the substrate 11 held in the jig 3.;COPYRIGHT: (C)2010,JPO&INPIT