Method for producing a titanium oxide target with excellent resistance to sputtering cracking resistance and strength

摘要

PROBLEM TO BE SOLVED: To provide a production method of a titanium oxide target which is excellent in strength and resistance to cracks at sputtering and is used for forming a titanium oxide thin film.;SOLUTION: In the production method, the titanium oxide target excellent in crack resistance is produced by sintering or hot-pressing a titanium oxide raw powder in a non-oxidizing atmosphere. Here, a mixed powder is used as the titanium oxide raw powder. The mixed powder is obtained by compounding and mixing a titanium dioxide superfine powder having a specific surface area measured by the BET method (hereinafter referred to as the BET value) of 30-80 m²/g with a titanium dioxide powder having a BET value of 5-10 m²/g. The mixed powder comprises 0.1-15 mass% titanium dioxide superfine powder and the balance being titanium dioxide powder.;COPYRIGHT: (C)2005,JPO&NCIPI