Electron beam apparatus having a function of detailed observation, and inspection and sample observation method of the sample by the electron beam apparatus

摘要

PROBLEM TO BE SOLVED: To provide a sample observation method capable of a detailed observation of a sample with the use of an identical electron beam device.;SOLUTION: The electron beam device 1 is used equipped with a primary optical system 10 irradiating electron beams on the surface of the sample, and a secondary optical system 30 forming images of the sample surface by detecting secondary electron beams emitted from the sample surface. The surface of the sample is inspected by irradiating the electron beams on the surface S of the sample, and after extracting defective sites of the sample according to the inspection, the electron beams are irradiated again on the extracted defective sites to carry out enlargement or detailed observation of the same.;COPYRIGHT: (C)2005,JPO&NCIPI