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A method of manufacturing the same, as well as immersion and exposure method for immersion lithography board
A method of manufacturing the same, as well as immersion and exposure method for immersion lithography board
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机译:一种制造方法以及浸没式光刻板的浸没和曝光方法
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摘要
A substrate having a photoresist film, capable of easily performing immersion lithography with high precision and stability, is provided. A surface tension of the substrate in a periphery region is lower than that of the substrate in a rest region. Immersion liquid supplied onto the photoresist film hardly leaks out, and the bubbles hardly occur in the immersion liquid.
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