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While the cleaning sealing device and the high purity quartz crucible null

机译:而清洗密封装置和高纯石英坩埚无效

摘要

PROBLEM TO BE SOLVED: To reduce an amount of an impurity metal on the surface of a quartz crucible by sequentially providing a means for injecting detergent onto an internal surface of the crucible, a means for drying the cleaned crucible and a means for sealing an opening of the crucible by a sheet in a clean room.;SOLUTION: A cleaning section A, a drying section B, a sealing section C and a transfer means X are provided in a clean room D to constitute an automatically cleaning and sealing apparatus for a quartz crucible R. The cleaning section A for cleaning an inner peripheral surface and a bottom face of the crucible R which has been transferred by the transfer means X comprises an acid cleaning section A1 and a pure water cleaning section A2. The drying section B includes a heating means such as a heater in a process for drying the crucible R. The sealing section C comprises a means C10 for supplying a sheet for sealing to a sealing position, a means C30 for putting the sheet over the crucible R at the sealing position and a means C40 for fixing the sheet to the crucible R in a process for sealing an opening of the crucible R by the sheet.;COPYRIGHT: (C)2001,JPO
机译:解决的问题:通过依次提供将洗涤剂注入到坩埚内表面的装置,干燥已清洗的坩埚的装置和密封开口的装置,以减少石英坩埚表面上的杂质金属量。解决方案:清洁室A中设有清洁区A,干燥区B,密封区C和转移装置X,以构成用于自动清洁和密封的设备。石英坩埚R的清洗部A用于清洗由转印机构X转印的坩埚R的内周面和底面,该清洗部A包括酸清洗部A1和纯水清洗部A2。干燥部B在干燥坩埚R的过程中包括诸如加热器的加热装置。密封部C包括用于将片材密封至密封位置的装置C10,将片材置于坩埚上方的装置C30。在密封位置处的R和在将薄片密封坩埚R的开口的过程中将薄片固定到坩埚R的装置C40。版权所有:(C)2001,JPO

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