And its backing plate assembly - the sputtering target manufacturing method thereof and a target composed of poorly sintered body of a refractory metal boride refractory metal alloy, refractory metal silicide, refractory metal carbides, or refractory metal nitride production method

摘要

Refractory metal plates of the target material and non-target material consisting of poorly sintered body of a refractory metal boride refractory metal alloy, refractory metal silicide, refractory metal carbides, or refractory metal nitrides are bonded target made of flame sintered body of a refractory metal boride refractory metal alloy is characterized in that it has a structure, a refractory metal silicide, refractory metal carbides, or refractory metal nitride. As well as to be produced relatively easily the target of poorly sintered body of a refractory metal boride refractory metal alloy machining difficult, refractory metal silicide, refractory metal carbides, or refractory metal nitride , refractory metal alloy to suppress the reaction between the die in a hot press at a target material, and also to effectively suppress the occurrence of cracks in high power sputtering target and manufacturing, it is possible to reduce the warpage of more targets, refractory I and a method for producing the target consists of flame sintered body of high-melting-point metal boride metal silicide, a refractory metal carbide or refractory metal nitride.