Using for the thin film accumulation device which by the fact that the liquid material which evaporates in the liquid material evaporation supply methodological null reaction interior

摘要

PROBLEM TO BE SOLVED: To provide a vaporizing/feeding device of a liquid material with which a liquid material can be vaporized and fed by minimum heating in a CVD (Chemical Vapor Deposition) process, and many materials can quickly and correctly be vaporized by prescribed quantities, to provide a thin film deposition apparatus, and to provide a vaporizing/feeding method of a liquid material.;SOLUTION: The device is used for a thin film deposition apparatus 1 where a thin film is deposited on a working object 12 by feeding a vaporized liquid material LM into a reaction chamber 11 under the reduced pressure, and comprises a pressurizing means 10 of applying pressure P to the liquid material LM, an injector body 14 for charging the liquid material LM pressurized by the pressurizing means 10, an injection port 14a formed on the tip of the injector body 14, and a stop valve 15 opening and closing the injection port 14a. The pressurized liquid material LM is atomized under the reduced pressure by opening the stop valve 15, and the liquid material LM can be vaporized by boiling under the reduced pressure.;COPYRIGHT: (C)2004,JPO&NCIPI