Three-Dimensional Array of Re-Programmable Non-Volatile Memory Elements Having Vertical Bit Lines and a Double-Global-Bit-Line Architecture

摘要

A three-dimensional array especially adapted for memory elements that reversibly change a level of electrical conductance in response to a voltage difference being applied across them. Memory elements are formed across a plurality of planes positioned different distances above a semiconductor substrate. A two-dimensional array of bit lines to which the memory elements of all planes are connected is oriented vertically from the substrate and through the plurality of planes. A double-global-bit-line architecture provides a pair of global bit lines for each bit lines for accessing a row of memory elements in parallel. A first one of each pair allows the local bit lines of the row to be sensed while a second one of each pair allows local bit lines in an adjacent row to be set to a definite voltage so as to eliminate leakage currents between adjacent rows of local bit lines.