Method for fabrication of mold for nano imprinting and method for production of photonic crystal using the same

摘要

A manufacturing process using a replica mold for nano imprinting having a grid type pattern by combining a nano imprint with a dry etching process is disclosed. In order to attain such a manufacturing process, a method of fabricating a mold for nano imprinting may include arranging a master mold having first patterns over a substrate having metal patterns so that both the first pattern and the metal pattern cross over each other, applying resin between the master mold and the substrate, applying an imprinting treatment of the substrate as well as the master mold, hardening the resin, and etching the hardened resin after the master mold is released, so as to form a replica mold for nano imprint. The nano imprinting process and the etching process may easily form a pattern in a more complicated structure, and therefore, may improve production yield and reduce processing time thereof.