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Process for preparing nanogap electrode and nanogap device using the same

机译:制备纳米间隙电极的方法和使用该方法的纳米间隙装置

摘要

The present invention relates to a process of preparing a nanogap electrode and a nanogap device using the same, and a preparing process according to the present invention is characterized in that reduced metal is grown by reduction reaction from a metal ion in solution on the surface of a metal pattern with a predetermined shape. A method of preparing a nanogap electrode according to the present invention has an advantage that nanogap electrodes having a gap distance of 1-100 nm, which are difficult to prepare by a conventional method, can be easily prepared in a reproducible and uniform manner.
机译:本发明涉及一种制备纳米间隙电极的方法和使用该方法的纳米间隙装置,并且根据本发明的制备方法的特征在于,还原的金属通过溶液中金属离子在溶液表面上的还原反应而生长。具有预定形状的金属图案。根据本发明的制备纳米间隙电极的方法的优点在于,可以容易地以可再现且均匀的方式制备具有通过常规方法难以制备的具有1-100nm的间隙距离的纳米间隙电极。

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