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RAISED FACET- AND NON-FACET 3D SOURCE/DRAIN CONTACTS IN MOSFETS

机译:MOSFET中提高的FACET和非FACET 3D源极/漏极接触

摘要

An apparatus comprising a semiconductor substrate; a conductively doped source or drain (source/drain) region at the surface of the substrate; a raised semiconductor layer deposited over the source/drain region to form a raised source/drain region; a via formed in the raised source/drain region having substantially vertical sidewalls reaching partly or substantially to the source/drain region; and a metal contact filling the via.
机译:一种设备,包括半导体衬底;衬底表面上的导电掺杂的源极或漏极(源极/漏极)区域;沉积在源/漏区上方的凸起半导体层,以形成凸起的源/漏区;形成在凸起的源极/漏极区域中的通孔,其具有基本垂直的侧壁,所述侧壁部分或基本到达所述源极/漏极区域。和金属触点填充通孔。

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