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Depletion mode trench MOSFET for improved efficiency of DC/DC converter applications

机译:耗尽型沟槽MOSFET可提高DC / DC转换器应用的效率

摘要

A DC-to-DC converter includes a high-side transistor and a low-side transistor wherein the high-side transistor is implemented with a high-side enhancement mode MOSFET. The low side-transistor further includes a low-side enhancement MOSFET shunted with a depletion mode transistor having a gate shorted to a source of the low-side enhancement mode MOSFET. A current transmitting in the DC-to-DC converter within a time-period between T2 and T3 passes through a channel region of the depletion mode MOSFET instead of a built-in diode D2 of the low-side MOSFET transistor. The depletion mode MOSFET further includes trench gates surrounded by body regions with channel regions immediately adjacent to vertical sidewalls of the trench gates wherein the channel regions formed as depletion mode channel regions by dopant ions having electrical conductivity type opposite from a conductivity type of the body regions.
机译:DC-DC转换器包括高侧晶体管和低侧晶体管,其中,高侧晶体管由高侧增强模式MOSFET实现。该低侧晶体管还包括与耗尽型晶体管并联的低侧增强MOSFET,该耗尽型晶体管的栅极短接到该低侧增强型MOSFET的源极。在T 2 和T 3 之间的时间段内,在DC-DC转换器中传输的电流会通过耗尽型MOSFET的沟道区域,而不是通过内置的低端MOSFET晶体管的输入二极管D 2 。耗尽型MOSFET进一步包括由主体区域围绕的沟槽栅极,该主体区域具有与沟槽栅极的垂直侧壁紧邻的沟道区域,其中,沟道区域由与主体区域的导电类型相反的导电类型的掺杂剂离子形成为耗尽模式沟道区域。 。

著录项

  • 公开/公告号US2010044796A1

    专利类型

  • 公开/公告日2010-02-25

    原文格式PDF

  • 申请/专利权人 FWU-IUAN HSHIEH;

    申请/专利号US20080229470

  • 发明设计人 FWU-IUAN HSHIEH;

    申请日2008-08-22

  • 分类号H01L29;H01L21/425;

  • 国家 US

  • 入库时间 2022-08-21 18:53:15

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