首页> 外国专利> Dense Gd-doped Ceria Layers on Porous Substrates and Methods of Making the Same

Dense Gd-doped Ceria Layers on Porous Substrates and Methods of Making the Same

机译:多孔基体上致密的掺d二氧化铈层及其制备方法

摘要

Solid-state ionic or electrochemical devices can depend critically on the proper formation of a dense, Gd-doped ceria (GDC) layer on a porous substrate. Devices and methods of the present invention are characterized by the formation of a transitional buffer layer, which is less than 10 microns thick and comprises GDC, located between the porous substrate and the dense GDC layer. The transitional buffer layer provides a practical way to form the dense GDC layer on the porous substrate without cracks in the GDC layer and without clogging the pores of the substrate.
机译:固态离子或电化学装置可能严重取决于在多孔基材上正确形成致密的,掺Gd的二氧化铈(GDC)层。本发明的装置和方法的特征在于形成过渡缓冲层,该过渡缓冲层小于10微米厚并且包含位于多孔基材和致密GDC层之间的GDC。过渡缓冲层提供了一种在多孔基材上形成致密GDC层的实用方法,而不会在GDC层中产生裂纹,也不会堵塞基材的孔。

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