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Multilayer structure comprising a substrate and a layer of silicon and germanium deposited heteroepitaxially thereon, and a process for producing it
Multilayer structure comprising a substrate and a layer of silicon and germanium deposited heteroepitaxially thereon, and a process for producing it
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机译:包括衬底以及在其上异质外延沉积的硅和锗层的多层结构及其制造方法
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摘要
A multilayer structure, comprises a substrate and a layer of silicon and germanium (SiGe layer) deposited heteroepitaxially thereon having the composition Si1-xGex and having a lattice constant which differs from the lattice constant of silicon, and a thin interfacial layer deposited on the SiGe layer and having the composition Si1-yGey, which thin interfacial layer binds threading dislocations, and at least one further layer deposited on the interfacial layer.
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机译:一种多层结构,包括基底和在其上异质外延沉积在其上的组成为Si 1-x Sub> Ge x Sub>的硅和锗层(SiGe层),其晶格常数为与硅的晶格常数不同,沉积在SiGe层上且组成为Si 1-y Sub> Ge y Sub>的薄界面层与界面位错结合;和至少一个另外的层,沉积在界面层上。
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