Method for improving heat stability of polyparaxylylene and derivative film thereof and polyparaxylylene derivative

摘要

A method for improving the heat stability of polyparaxylylene and a derivative film thereof to improve the heat resistance of the polyparaxylylene and the derivative film thereof without deteriorating deposition characteristics or profitability, and a polyparaxylylene derivative whose heat resistance is improved are provided. When the polyparaxylylene or the derivative film thereof represented by a below-described general formula 1 is formed by a chemical vapor deposition method, an amino-(2.2)-paracyclophane compound represented by a below-described general formula 3 is mixed in a (2.2)-paracyclophane compound represented by a below-described general formula 2 to form a film.; (In the formula 1, X₁ and X₂ designate hydrogen, lower alkyl or halogen. X₁ and X₂ may be the same or different. n represents a degree of polymerization.); (In the formula 2, X₁ and X₂ have the same meanings as those of the formula 1.); (In the formula 3, X₃ designates hydrogen or a lower alkyl group. Y₁ and Y₂ designate hydrogen or an amino group and both Y₁ and Y₂ are not hydrogens at the same time.)