首页> 外国专利> Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element

机译:用于在EUV和/或软X射线区域中进行辐射的光学元件以及具有至少一个光学元件的光学系统

摘要

An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.
机译:描述了一种用于EUV和/或软X射线区域中的波长的辐射的光学元件,特别是法向入射收集镜。该元件具有衬底,具有光学活性区域的多层涂层以及具有第一和第二电容器电极的电容器。多层涂层的至少一层用作第一电容器电极。在两个电容器电极之间设置至少一个介电层。还描述了具有至少一个光学元件的光学系统,该光学系统具有布置在光学元件附近的第一电极。

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