首页> 外国专利> Phase change memory cell having interface structures with essentially equal thermal impedances and manufacturing methods

Phase change memory cell having interface structures with essentially equal thermal impedances and manufacturing methods

机译:具有具有基本相等的热阻的界面结构的相变存储单元及其制造方法

摘要

A memory device as described herein includes a memory member contacting first and second interface structures. The first interface structure electrically and thermally couples the memory member to access circuitry and has a first thermal impedance therebetween. The second interface structure electrically and thermally couples the memory member to a bit line structure and has a second thermal impedance therebetween. The first and second thermal impedances are essentially equal such that applying a reset pulse results in a phase transition of an active region of the memory member spaced away from both the first and second interface structures.
机译:如本文所述的存储装置包括接触第一和第二接口结构的存储构件。所述第一接口结构将所述存储构件电热耦合至访问电路,并且在其间具有第一热阻抗。第二接口结构将存储构件电热耦合到位线结构,并且第二接口结构在其间具有第二热阻。第一热阻抗和第二热阻抗基本相等,使得施加复位脉冲导致存储构件的有源区域的相变与第一和第二界面结构均隔开。

著录项

  • 公开/公告号US7646631B2

    专利类型

  • 公开/公告日2010-01-12

    原文格式PDF

  • 申请/专利权人 HSIANG-LAN LUNG;

    申请/专利号US20070952646

  • 发明设计人 HSIANG-LAN LUNG;

    申请日2007-12-07

  • 分类号G11C11/00;

  • 国家 US

  • 入库时间 2022-08-21 18:50:05

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