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Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
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机译:进行氢光发射终点检测以去除光刻胶和去除残留物的方法和装置
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摘要
Methods for monitoring and detecting optical emissions while performing photoresist stripping and removal of residues from a substrate or a film stack on a substrate are provided herein. In one embodiment, a method is provided that includes positioning a substrate comprising a photoresist layer into a processing chamber; processing the photoresist layer using a multiple step plasma process; and monitoring the plasma for a hydrogen optical emission during the multiple step plasma process; wherein the multiple step plasma process includes removing a bulk of the photoresist layer using a bulk removal step; and switching to an overetch step in response to the monitored hydrogen optical emission.
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