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Illumination of a patterning device based on interference for use in a maskless lithography system
Illumination of a patterning device based on interference for use in a maskless lithography system
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机译:用于无掩模光刻系统的基于干涉的图案形成装置的照明
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摘要
A lithographic apparatus in which beams of radiation are projected onto an array of individually controllable elements, such that the beams interfere. Radiation that is further modulated by the array of individually controllable elements is projected onto a substrate.
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