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Laser light source device, exposure device, and mask inspection device using this laser light source device
Laser light source device, exposure device, and mask inspection device using this laser light source device
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机译:使用该激光光源装置的激光光源装置,曝光装置以及掩模检查装置
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摘要
A laser light source device 1, comprising M number of laser light sources, of which frequency is shifted from a fundamental frequency by (m−1)·a·Δω, a first laser light source section 2 and a first fiber amplifier section 4 for amplifying these laser lights, a first optical multiplexer 6 for approximately coaxially superimposing the laser lights emitted from the first fiber amplifier section 4 and emitting the laser lights, a first wavelength conversion device 9 for multiplying the frequency of the laser lights emitted from the first optical multiplexer 6 by A, M number of laser light sources, of which frequency is shifted from the fundamental frequency by (m−1)·b·Δω, a second laser light source section 3 and a second fiber amplifier section 5 for amplifying these laser lights, a second optical multiplexer 7 for approximately coaxially superimposing the laser lights emitted from the second fiber amplifier section 5 and emitting the laser lights, a second wavelength conversion device 10 for multiplying the frequency of the laser lights emitted from the second optical multiplexer 7 by B, and a third wavelength conversion device 11 for simultaneously receiving the laser lights emitted from the first and second wavelength conversion devices 9 and 10 and converting the laser lights into laser lights, of which frequency is (A+B) times the fundamental frequency, the laser light source device 1 being characterized in that the expression A·a+B·b=0 is satisfied.
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