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Method of manufacturing transistor that utilizes current direction limiting units between phase change layer and bit lines and between phase change layer and word lines

机译:利用在相变层和位线之间以及相变层和字线之间的电流方向限制单元的晶体管的制造方法

摘要

A transistor in which a physical property of its channel is changed according to an applied voltage, and methods of manufacturing and operating the same are provided. The transistor may include a first conductive layer on a substrate, a phase change layer and a second conductive layer which are sequentially stacked on the first conductive layer, a first current direction limiting unit and a second current direction limiting unit formed on the second conductive layer by being separated within a space, a third conductive layer and a fourth conductive layer formed on the first current direction limiting unit and the second current direction limiting unit, respectively, a word line connected to the third conductive layer, a bit line connected to the fourth conductive layer, and a voltage lowering unit connected to the word line.
机译:提供了一种晶体管,该晶体管的沟道的物理特性根据所施加的电压而改变,并且提供了一种制造和操作该晶体管的方法。所述晶体管可以包括:在基板上的第一导电层,相变层和第二导电层,它们依次堆叠在第一导电层上;形成在第二导电层上的第一电流方向限制单元和第二电流方向限制单元。通过在空间中分开,分别在第一电流方向限制单元和第二电流方向限制单元上形成的第三导电层和第四导电层连接到第三导电层的字线,连接到导电层的位线。第四导电层,和连接到字线的降压单元。

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