首页> 外国专利> SON MOSFET using a beam structure and method for fabricating thereof

SON MOSFET using a beam structure and method for fabricating thereof

机译:使用梁结构的SON MOSFET及其制造方法

摘要

The present invention relates to a SON (Silicon-On-Nothing) MOSFET having a beam structure and an inverter using thereof and the method for fabricating thereof to increase the efficiency and performance of a MOSFET. A method for fabricating the SON MOSFET according to the present invention comprises the steps of (a) patterning a passivation layer on a substrate, (b) doping boron on the substrate, (c) removing the patterned passivation layer, (d) forming the beam structure on the substrate by anisotropical etching on the region not doped with boron of the substrate, (e) depositing an insulating material on the substrate having the beam structure, and (f) deposing an electrode material on the disposed insulating material.
机译:具有束结构的SON(无硅)MOSFET及其逆变器技术领域本发明涉及一种具有梁结构的SON(无硅)MOSFET及其逆变器及其制造方法,以提高MOSFET的效率和性能。根据本发明的用于制造SON MOSFET的方法包括以下步骤:(a)在衬底上构图钝化层,(b)在衬底上掺杂硼,(c)去除构图的钝化层,(d)形成衬底。通过在没有掺杂衬底的硼的区域上进行各向异性蚀刻而在衬底上形成束状结构,(e)在具有束结构的衬底上沉积绝缘材料,以及(f)在布置的绝缘材料上沉积电极材料。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号