MATERIAL MADE OF TWO THIN REFLECTIVE LAYERS FOR THE ELECTROMAGNETIC RADIATIONS WITH A WAVELENGTH RANGING FROM 10 TO 20 NM

摘要

The invention relates to extreme ultraviolet reflective material hereinafter referred as EUV, as thin mono- and multi-layers, adhering to the support whereon there were coated, used as mirrors under conditions of glancing incidence in EUV radiation litography. According to the invention, the materials are mono- and multi-layer, produced by physical vapour deposition in a reactive plasma, which may contain atoms and ions of titanium, zirconium, nitrogen and carbon, depending on the specific composition of the deposited material, being formed of one, namely two types of various alternating thin layers, the multi-layer materials comprising a number of 30 ... 100 pairs of individual layers, both the mono- and multi-layer materials having a total thickness ranging from 250 to 800 nm, exhibiting reflective properties for EUV radiation with the wavelength ranging from 10 to 20 nm, being resistant to the erosion due to energetic particle bombardment, said particles emerging from EUV radiation sources, and having micro-structural, mechanical tribological properties, stable in time, and with the temperature variation of the substratum, the coating of mirror substrata for EUV radiation with mono- and multi-layer materials determining the lifespan thereof to increase in EUV litography system.