首页> 外国专利> LOW EMITTANCE STRATIFIED SYSTEM, WHICH CAN BE SUBMITTED TO HIGH THERMAL REQUIREMENTS, PROCEDURE FOR THE MANUFACTURE AND USE OF SUBSTRATES COATED WITH THE STRATIFIED SYSTEM.

LOW EMITTANCE STRATIFIED SYSTEM, WHICH CAN BE SUBMITTED TO HIGH THERMAL REQUIREMENTS, PROCEDURE FOR THE MANUFACTURE AND USE OF SUBSTRATES COATED WITH THE STRATIFIED SYSTEM.

机译:低辐射分层系统,可以满足较高的热要求,制造和使用涂覆有分层系统的基材的过程。

摘要

Low-E stratified system that can be subjected to high thermal demands and reflects heat, for transparent substrates (1), preferably glass, with at least the following layer structure consisting of at least one base layer (2) of an oxidic compound and / or a nitride type compound, at least one functional layer (3) of silver, at least one barrier layer (4) and at least one covering layer (5) based on an oxidic compound and / or a compound nitride type, characterized in that the barrier layer (4) disposed above the functional layer (3) is constituted by a metal nitride, for whose extinction coefficient k (lambda) in the wavelength range 380 nm = 780 = nm for each lambda governs k (lambda) 0.2, where the stratified system does not contain metallic layers or non-stoichiometric metal compounds either above or below the functional layer (3), and the barrier layer (4) It has a thickness of 1 nm to 10 nm.
机译:适用于透明基板(1)(最好是玻璃)的Low-E分层系统,该系统可承受较高的热量需求并反射热量,至少具有以下层结构,该层结构至少由一层氧化性化合物的基础层(2)和/或氮化物类化合物,至少一种银功能层(3),至少一层阻挡层(4)和至少一层基于氧化物和/或化合物氮化物类的覆盖层(5),其特征在于设置在功能层(3)上方的势垒层(4)由金属氮化物构成,对于每个λ,其波长范围380 nm <= 780 <= nm的消光系数k(λ)决定k(λ)< 0.2,其中分层体系在功能层(3)的上方或下方不包含金属层或非化学计量的金属化合物,而阻挡层(4)的厚度为1 nm至10 nm。

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