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HIGH THROUGHPUT PHYSICAL VAPOR DEPOSITION SYSTEM FOR MATERIAL COMBINATORIAL STUDIES
HIGH THROUGHPUT PHYSICAL VAPOR DEPOSITION SYSTEM FOR MATERIAL COMBINATORIAL STUDIES
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机译:用于材料组合研究的高通量物理气相沉积系统
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摘要
An infinitely variable physical vapor deposition matrix system that allows thesynthesis of multiple combinatorial catalyst samples at essentially the sametime, by the co-deposition of multiple materials, or the sequential layer bylayer deposition of multiple catalyst constituents, or both, such that theoptimum mix of materials for a pre-determined application can beexperimentally determined in subsequent testing. The discovery of optimalcatalyst combinations for utilization in specified reactions and devices isfacilitated. The high throughput system reduces the time and complexity ofprocessing typically required to formulate and test combinatorial catalystmaterials.
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