首页> 外国专利> High throughput physical vapor deposition system for material combinatorial studies

High throughput physical vapor deposition system for material combinatorial studies

机译:高通量物理气相沉积系统,用于材料组合研究

摘要

An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determined in subsequent testing. The discovery of optimal catalyst combinations for utilization in specified reactions and devices is facilitated. The high throughput system reduces the time and complexity of processing typically required to formulate and test combinatorial catalyst materials.
机译:一种无限可变的物理气相沉积矩阵系统,该系统允许通过多种材料的共沉积,或通过逐层沉积多种催化剂成分的方式,或两者,在基本上相同的时间合成多个组合催化剂样品。可以在后续测试中通过实验确定用于预定用途的最佳材料混合。有助于发现用于特定反应和装置的最佳催化剂组合。高通量系统减少了配制和测试组合催化剂材料通常所需的时间和复杂性。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号