THIN FILM COMPRISING TITANIUM OXIDE AS MAJOR COMPONENT AND SINTERED SPUTTERING TARGET COMPRISING TITANIUM OXIDE AS MAJOR COMPONENT

摘要

A thin film comprising titanium oxide as a major component, characterized by comprising titanium, oxygen, and copper, the contents of titanium and copper being 29.0-34.0 at.% and 0.003-7.7 at.%, respectively, with the remainder being oxygen and incidental impurities, the ratio of the oxygen component to the metal components, O/(2Ti+0.5Cu), being 0.96 or higher. A thin film comprising titanium oxide as a major component and having a high refractive index and a low extinction coefficient and a sintered sputtering target comprising titanium oxide as a major component and suitable for use in producing the thin film are obtained. A thin film having excellent transmittance, inhibited from decreasing in reflectance, and useful as an interference film or protective film for optical information recording media is also obtained. Furthermore, a thin film applicable to glass substrates as a heat ray reflecting film, antireflection film, or interference filter is obtained.