TWO-DIMENSIONAL MEASURING INSTRUMENT AND TWO-DIMENSIONAL MEASURING METHOD

摘要

Provided is a two-dimensional measuring method which includes: a step (S21) of measuring the coordinate values of a reference point obtained from a reference pattern provided on a substrate by means of two image pickup systems, which are provided on an image pickup section and have magnifying powers different from each other, using a two-dimensional measuring tool which measures the coordinate positions of one area on the surface of the substrate by means of one image pickup system selected each time out of the two image pickup systems; a step (S22) of calculating the deviation quantity between the measurement values obtained by the two image pickup systems in the measuring step; and a step (S23) of setting the deviation quantity as a correction parameter. Each time before or after performing the measuring operation to the substrates of a fixed quantity, the step (S21), the step (S22) and the step (S23) are performed.