MICROWAVE PLASMA PROCESSING APPARATUS AND A METHOD OF SUPPLYING MICROWAVES USING THE SAME, CAPABLE OF SUPPRESSING THE CHANGE OF A TRANSMISSION PATH

摘要

PURPOSE: A microwave plasma processing apparatus and a method of supplying microwaves using the same are provided to prevent the scattering of plasma by preventing the change of the transmission path due to thermal expansion.;CONSTITUTION: A microwave plasma processing apparatus(10) comprises a plasma treatment container(100), a microwave source(335), a waveguide(305), a coaxial converter(310), an internal conductor of the coaxial waveguide, a first contact member(330), a radial line slot antenna(205), and a first spring member(375). The waveguide transmits microwave outputted from the microwave source. The coaxial converter changes the mode of the microwave transmitted to the waveguide. The internal conductor of the coaxial waveguide is connected in order to slide on the coaxial converter. The first contact member electrically connects the coaxial converter and the internal conductor. The first spring member absorbs the displacement of the upper member of the radial line slot antenna.;COPYRIGHT KIPO 2010