首页>
外国专利>
How to improve the clear field phase reversal mask by adding lines parallel to the phase 0 region
How to improve the clear field phase reversal mask by adding lines parallel to the phase 0 region
展开▼
机译:如何通过添加与相位0区域平行的线来改善明场相位反转掩模
展开▼
页面导航
摘要
著录项
相似文献
摘要
A technique in which a boundary region is added to the outside parallel edge of phase zero (0) pattern defining polygons. This technique can reduce the need for optical proximity correction (OPC) and improve the manufacturability and patterning process window for integrated circuits. The technique can also set the width of both phase 0 and phase 180 polygons to specific sizes, making OPC easier to assign.
展开▼