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GAN LASERS ON ALN SUBSTRATES AND METHODS OF FABRICATION

机译:Aln衬底上的GAN激光及其制造方法

摘要

Ga(In)N-based laser structures and related methods of fabrication are proposed where Ga (In)N-based semiconductor laser structures are formed on AlN or GaN substrates (20) in a manner that addresses the need to avoid undue tensile strain in the semiconductor structure. In accordance with one embodiment of the present invention, a Ga (In)N-based semiconductor laser is provided on an AlN or GaN substrate provided with an AlGaN lattice adjustment layer (30) where the substrate (20), the lattice adjustment layer (30), the lower cladding region (60), the active waveguiding region (40), the upper cladding region (50), and the N and P type contact regions (70, 60) of the laser form a compositional continuum in the semiconductor laser. Additional embodiments are disclosed and claimed.;COPYRIGHT KIPO & WIPO 2010
机译:提出了基于Ga(In)N的激光结构和相关的制造方法,其中以解决避免在AlN或GaN衬底(20)中过度拉伸应变的需要的方式在AlN或GaN衬底(20)上形成基于Ga(In)N的半导体激光器结构。半导体结构。根据本发明的一个实施例,在具有AlGaN晶格调节层(30)的AlN或GaN衬底上提供基于Ga(In)N的半导体激光器,其中衬底(20),晶格调节层(如图30所示,激光器的下部包层区域(60),有源波导区域(40),上部包层区域(50)以及N型和P型接触区域(70、60)在半导体中形成组成连续体。激光。公开并要求保护其他实施例。版权所有KIPO和WIPO 2010

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