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CONTROLLING PASSIVATING FILM PROPERTIES USING COLLOIDAL PARTICLES POLYELECTROLYTES, AND IONIC ADDITIVES FOR COPPER CHEMICAL MECHANICAL PLANARIZATION
CONTROLLING PASSIVATING FILM PROPERTIES USING COLLOIDAL PARTICLES POLYELECTROLYTES, AND IONIC ADDITIVES FOR COPPER CHEMICAL MECHANICAL PLANARIZATION
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机译:使用胶体微粒聚合物和离子助剂控制铜化学机械平面化的钝化膜性能
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摘要
The present invention provides for a copper CMP slurry composition which comprises a complexing agent, an oxidizer, an abrasive and a passivating agent. The present invention also provides for a method of chemical mechanical planarization of a copper conductive structure which comprises administering the copper CMP slurry composition during the planarization process.;COPYRIGHT KIPO & WIPO 2010
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