REFLECTIVE MASK BLANK, A MANUFACTURING METHOD THEREOF, AND A METHOD FOR MANUFACTURING A REFLECTIVE MASK, CAPABLE OF FORMING A PROTECTIVE LAYER WITH CHEMICAL RESISTANCE AGAINST CLEANING ON A MULTILAYER REFLECTIVE LAYER

摘要

PURPOSE: A reflective mask blank, a manufacturing method thereof, and a method for manufacturing a reflective mask are provided to prevent the degradation of reflectivity by cleaning a haze on a mask.;CONSTITUTION: A reflective mask blank comprises a substrate(1), a multilayer reflective layer(2), a protective layer(6) and an absorber layer(4). The multilayer reflective layer reflects the exposure light formed on the substrate. The protective layer is formed on the multilayer reflective layer and protects the multilayer reflective layer. An absorbing layer absorbs the exposure light on the protective layer. The protective layer is made of ruthenium compound and an oxide layer. The ruthenium compound contains Ru and X. The X contains Nb or Zr. An oxide layer made of X is formed on the surface of the protective layer.;COPYRIGHT KIPO 2010