HEATER AND AN APPARATUS FOR MANUFACTURING A SILICON MONO-CRYSTALLINE INCLUDING THE SAME, CAPABLE OF IMPROVING THE TEMPERATURE GRADIENT OF A SOLID-LIQUID INTERFACE

摘要

PURPOSE: A heater and an apparatus for manufacturing a silicon mono-crystalline including the same are provided to improve the growth rate of a mono-crystalline ingot by including a high temperature heater unit and a low temperature heater unit.;CONSTITUTION: The heater in an apparatus for manufacturing a mono-crystalline manufactures the mono-crystalline using a czochralski method including a cylindrical shape of a heater unit(300). The heater unit includes a first slit(310) and a second slit(320). The first slit and the second slit are alternately arranged to form a zig-zag shape. The first slit expands from the lower side of the heater to the upper side of the heater. The second slit expands from the upper side of the heater to the lower side of the heater. The heater unit includes a low temperature heater unit(200) and a high temperature heater unit(100).;COPYRIGHT KIPO 2010