首页> 外国专利> METHOD FOR GROWING A MONO-CRYSTALLINE INGOT AND THE MONO-CRYSTALLINE INGOT, CAPABLE OF REDUCING FAILURE RATE DUE TO NON-UNIFORM OXYGEN CONCENTRATION IN A SILICON WAFER

METHOD FOR GROWING A MONO-CRYSTALLINE INGOT AND THE MONO-CRYSTALLINE INGOT, CAPABLE OF REDUCING FAILURE RATE DUE TO NON-UNIFORM OXYGEN CONCENTRATION IN A SILICON WAFER

机译:用于生长单晶硅片和单晶硅片的方法,由于硅晶片中的氧气浓度不均匀,该单晶硅片和单晶硅片能够降低失效率

摘要

PURPOSE: A method for growing a mono-crystalline ingot and the mono-crystalline ingot are provided to uniformly form the concentration of oxygen which is introduced to the mono-crystalline ingot by mixing a melt in a crucible by generating temperature variation in the crucible.;CONSTITUTION: A magnetic field is applied to a melt in a crucible(10). The magnetic field is horizontal magnetic field. The temperature variation is generated with respect to a part adjacent to the crucible and the center part of the crucible in order to mix the melt. A mono-crystalline ingot is grown from the melt. A heater(30) applies heat to the melt.;COPYRIGHT KIPO 2010
机译:目的:提供一种用于生长单晶锭的方法,该单晶锭通过在坩埚中通过产生坩埚中的温度变化来混合熔体,从而均匀地形成引入单晶锭的氧气浓度。 ;组成:磁场作用于坩埚中的熔体(10)。磁场是水平磁场。为了与熔体混合,相对于坩埚附近的部分和坩埚的中心部分产生温度变化。从熔体中生长出单晶锭。加热器(30)向熔体加热。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100084825A

    专利类型

  • 公开/公告日2010-07-28

    原文格式PDF

  • 申请/专利权人 SILTRON INC.;

    申请/专利号KR20090004176

  • 申请日2009-01-19

  • 分类号C30B15/20;C30B15/14;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:11

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