首页> 外国专利> OPTICAL CHARACTERISTIC MEASURING METHOD, OPTICAL CHARACTERISTIC ADJUSTING METHOD, EXPOSING DEVICE, EXPOSING METHOD, AND EXPOSING DEVICE MANUFACTURING METHOD

OPTICAL CHARACTERISTIC MEASURING METHOD, OPTICAL CHARACTERISTIC ADJUSTING METHOD, EXPOSING DEVICE, EXPOSING METHOD, AND EXPOSING DEVICE MANUFACTURING METHOD

机译:光学特性测量方法,光学特性调整方法,曝光设备,曝光方法以及曝光设备制造方法

摘要

Provided is an optical characteristic measuring method for measuring the optical characteristics of an optical system to form the image of an object arranged on a first surface, on a second surface. A first region for a measuring light to pass therethrough or to be reflected thereon is arranged (at S20) in the first surface. A second region for the measuring light to pass therethrough or to be reflected thereon is arranged (at S21) at a position lying in the second surface and corresponding to the first region.The quantities of the measuring light through either the first region or the second region and the optical system are detected (at S23 and S24) through the other of the first region and the second region. At least one of the first region and the second region is so shaped that the quantity of the measuring light to pass through or to be reflected on the optical system changes according to those optical characteristics.
机译:提供一种光学特性测量方法,用于测量光学系统的光学特性以在第二表面上形成布置在第一表面上的物体的图像。在第一表面中布置有用于测量光穿过的第一区域或在其上被反射的第一区域(在S20处)。在步骤S21中,位于第二表面中并且与第一区域相对应的位置处布置有用于使测量光穿过或在其上反射的第二区域。通过第一区域和第二区域中的另一个来检测区域和光学系统(在S23和S24)。第一区域和第二区域中的至少一个被成形为使得通过或将在光学系统上反射的测量光的量根据那些光学特性而变化。

著录项

  • 公开/公告号KR20100049557A

    专利类型

  • 公开/公告日2010-05-12

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;

    申请/专利号KR20107001547

  • 发明设计人 OOKI HIROSHI;NAKAMURA AYAKO;

    申请日2008-06-24

  • 分类号H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:49

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