首页> 外国专利> LOW TEMPERATURE PROCESSABLE AND PHOTO-CROSSLINKABLE ORGANIC GATE INSULATOR, AND AN ORGANIC THIN FILM TRANSISTOR DEVICE USING THEREOF

LOW TEMPERATURE PROCESSABLE AND PHOTO-CROSSLINKABLE ORGANIC GATE INSULATOR, AND AN ORGANIC THIN FILM TRANSISTOR DEVICE USING THEREOF

机译:低温可加工且可光交联的有机门绝缘子,以及使用该绝缘子的有机薄膜晶体管器件

摘要

PURPOSE: An organic gate insulator and an organic thin film transistor device using thereof are provided to form an organic insulating layer using a polyimide polymer, and to reduce a leakage current of the insulator through a photo-curing.;CONSTITUTION: An organic gate insulator for an organic thin film transistor device contains a polyimide polymer. The producing method of the polyimide polymer comprises a step of reacting polyimide including a hydroxy group with acryloyl-based halide. The organic thin film transistor device comprises a gate electrode, an organic insulating film, an organic semiconductor layer, a source electrode and a drain electrode on a glass or a plastic substrate. The organic insulating film is formed by spraying a coating solution including the polyimide polymer to the substrate including the gate electrode, and photo-curing.;COPYRIGHT KIPO 2010
机译:目的:提供有机栅绝缘体和使用其的有机薄膜晶体管器件,以使用聚酰亚胺聚合物形成有机绝缘层,并通过光固化减少绝缘体的泄漏电流。用于有机薄膜晶体管的器件包含聚酰亚胺聚合物。聚酰亚胺聚合物的制造方法包括使包含羟基的聚酰亚胺与丙烯酰基系卤化物反应的步骤。有机薄膜晶体管器件在玻璃或塑料基板上包括栅电极,有机绝缘膜,有机半导体层,源电极和漏电极。有机绝缘膜是通过将包含聚酰亚胺聚合物的涂料溶液喷涂到具有栅电极的基板上并进行光固化而形成的。COPYRIGHTKIPO 2010

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