首页> 外国专利> NOZZLE FOR SPRAYING A CLEANING SOLUTION AND A SUBSTRATE CLEANING DEVICE INCLUDING THE SAME, CAPABLE OF SPRAYING THE CLEANING SOLUTION WITH HIGH PRESSURE DROP

NOZZLE FOR SPRAYING A CLEANING SOLUTION AND A SUBSTRATE CLEANING DEVICE INCLUDING THE SAME, CAPABLE OF SPRAYING THE CLEANING SOLUTION WITH HIGH PRESSURE DROP

机译:用于喷射清洁溶液的喷嘴和包括该喷嘴的基本清洁设备,可以用高压液滴喷射清洁溶液

摘要

PURPOSE: A nozzle for spraying a cleaning solution and a substrate cleaning device including the same are provided to improve impurity removal effect by uniformly applying force to a substrate with an uneven structure of a spray nozzle.;CONSTITUTION: A cleaning solution spray nozzle(100) has cleaning solution spray holes(110). The cleaning solution spray holes sprays the cleaning solution on the substrate to clean the substrate and are formed on the lower side of the cleaning solution spray nozzle to face the substrate. The lower side has an uneven shape. A plurality of concave parts(122) or protrusions has the lower side.;COPYRIGHT KIPO 2010
机译:用途:喷洒清洗液的喷嘴和包括该喷嘴的基板清洗装置可通过向喷嘴结构不均匀的基板上均匀施加力来提高除杂效果。组成:清洗液喷嘴(100 )上有清洁液喷孔(110)。清洁液喷雾孔将清洁液喷雾到基板上以清洁基板,并且清洁孔形成在清洁液喷嘴的下侧以面对基板。下侧具有不平坦的形状。下侧有多个凹入部分(122)或突起。; COPYRIGHT KIPO 2010

著录项

  • 公开/公告号KR20100055767A

    专利类型

  • 公开/公告日2010-05-27

    原文格式PDF

  • 申请/专利权人 SEMES CO. LTD.;

    申请/专利号KR20080114636

  • 发明设计人 CHOI JEONG YEOL;

    申请日2008-11-18

  • 分类号H01L21/302;B05C5/02;G02F1/13;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:41

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号