SUBSTRATE PROCESSING APPARATUS WITH NOZZLES CAPABLE OF IMPROVING CLEANING EFFICIENCY AND METHOD THEREOF BY SPRAYING CLEANING SOLUTION DIRECTLY

摘要

PURPOSE: A substrate processing apparatus and a method thereof are provided to improve the efficiency of cleaning and to prevent particles from being attached to a substrate again by spraying directly a cleaning solution to a portion of the substrate exposed to the outside from the surface of a stored cleaning solution using nozzles. CONSTITUTION: A substrate processing apparatus(100) includes a processing bath, a lower supply part, an upper supply part and a gas supply part. The processing bath(111) stores a plurality of substrates(W). The lower supply part(140) is used for supplying a cleaning solution from a lower portion of the processing bath. The upper supply part is used for supplying the cleaning solution from an upper portion of the processing bath. The gas supply part(130) is used for removing moisture from the substrates. The upper supply part includes a plurality of nozzles(154).