首页> 外国专利> LOW TEMPERATURE JOINING METHOD BETWEEN TI/TI-BASED ALLOYS HAVING A BONDING STRENGTH HIGHER THAN THOSE OF BASE METALS

LOW TEMPERATURE JOINING METHOD BETWEEN TI/TI-BASED ALLOYS HAVING A BONDING STRENGTH HIGHER THAN THOSE OF BASE METALS

机译:TI / TI基合金的结合强度高于贱金属的低温结合方法

摘要

PURPOSE: A low temperature junction method of Ti/Ti-based alloys is provided to achieve improvement of strength by heating a zirconium-based interposer at a low temperature less than 900C over the melting temperature to join Ti/Ti-based alloy base materials. CONSTITUTION: A low temperature junction method of Ti/Ti-based alloys is as follows. A zirconium-based interposer is positioned between the Ti/Ti-based alloy base materials and heated at a low temperature less than 900C over the melting temperature, thereby joining the Ti/Ti-based alloy base materials. The zirconium-based amorphous interposer is composed of zirconium 20~50 atomic percentage, titanium 5~50 atomic percentage, copper 5~25 atomic percentage, nickel 1~20 atomic percentage, and beryllium 15~35 atomic percentage.
机译:目的:提供一种Ti / Ti基合金的低温结方法,通过在低于熔化温度的900°C以下的低温下加热锆基中介层,以接合Ti / Ti基合金基体材料,从而提高强度。组成:Ti / Ti基合金的低温结法如下。锆基中介层位于Ti / Ti基合金基体材料之间,并在低于熔化温度的900℃以下的低温下加热,从而接合Ti / Ti基合金基体材料。锆基非晶中介层由20〜50原子百分比的锆,5〜50原子百分比的钛,5〜25原子百分比的铜,镍1〜20原子百分比和铍15〜35原子百分比组成。

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