MATERIAL FOR FORMING AN ANTIREFLECTIVE FILM INCLUDING POLYMERS WITH A SPECIFIC EXTINCTION COEFFICIENT AND A REFRACTIVE INDEX, THE ANTIREFLECTIVE FILM, AND A METHOD FOR FORMING A PATTERN USING THE SAME

摘要

PURPOSE: A material for forming an antireflective film, the antireflective film manufactured using the same, and a method for forming a pattern are provided to effectively prevent the reflection of exposure light and to obtain a high dry etching speed.;CONSTITUTION: A material for forming an antireflective film contains a polymer having a repeating unit which is marked as a chemical formula 1 and a polymer having an aromatic ring and an extinction coefficient(k value) of 0.3 ~ 1.2. The polymer marked as the chemical formula 1 has the extinction coefficient of 0.01 ~ 0.4 and a refractive index(n value) of 1.4 ~ 2.1. In the chemical formula 1, R1 is a hydrogen atom, a methyl group, fluorine, or a trifluoromethyl group.;COPYRIGHT KIPO 2010