首页> 外国专利> ALUMINOUS SINTER, PROCESS FOR PRODUCING THE SAME, MEMBER FOR SEMICONDUCTOR PRODUCTION APPARATUS, MEMBER FOR LIQUID-CRYSTAL-PANEL PRODUCTION APPARATUS, AND MEMBER FOR DIELECTRIC RESONATOR

ALUMINOUS SINTER, PROCESS FOR PRODUCING THE SAME, MEMBER FOR SEMICONDUCTOR PRODUCTION APPARATUS, MEMBER FOR LIQUID-CRYSTAL-PANEL PRODUCTION APPARATUS, AND MEMBER FOR DIELECTRIC RESONATOR

机译:氧化铝烧结体,相同的生产工艺,半导体生产设备的成员,液晶面板生产设备的成员以及电谐振器的成员

摘要

[PROBLEMS] To provide: an aluminous sinter capable of lowering dielectric dissipation factor in the megahertz to gigahertz bands; a process for producing the sinter; a member for semiconductor production apparatuses; a member for liquid-crystal-panel production apparatuses; and a member for dielectric resonators. [MEANS FOR SOLVING PROBLEMS] The aluminous sinter comprises at least 99.3 mass% aluminum in terms of Al2O3 and other elements including at least 0.05 mass% silicon in terms of SiO2 and at least 0.01 mass% strontium in terms of SrO, is constituted of alumina crystal grains (1) as main crystal grains, and has a crystal phase at triple points (2) constituted of alumina grain particles (1), the crystal phase containing the elements Si, Al, Sr, and O. This aluminous sinter can retain the excellent corrosion resistance, mechanical properties, and electrical properties of alumina. In addition, since the crystal phase comprising a compound containing the elements Si, Al, Sr, and O and having a low loss is present at the triple points (2) constituted of alumina crystal grains (1), the aluminous sinter can have a lower loss than conventional ones in the megahertz to gigahertz bands.;COPYRIGHT KIPO & WIPO 2010
机译:&lsqb;问题&rsqb;提供:一种能够降低兆赫兹至千兆赫兹频带中介电损耗因子的铝烧结体;烧结矿的生产过程;半导体生产设备的构件;液晶面板制造装置用部件。和用于介电共振器的构件。 &lsqb;解决问题的方法&rsqb;该铝烧结体包含至少99.3质量%的铝(以Al 2 O 3 计)和其他元素,包括至少0.05质量%的硅(以SiO 2 < / Sub,以SrO计,至少含有0.01质量%的锶,由氧化铝晶粒(1)作为主晶粒,在由氧化铝晶粒(1)构成的三点(2)具有晶相。包含Si,Al,Sr和O的结晶相。这种铝烧结体可以保持氧化铝的优异耐腐蚀性,机械性能和电性能。另外,由于在由氧化铝晶粒(1)构成的三点(2)处存在包含具有Si,Al,Sr和O的元素的化合物并且损耗低的结晶相,所以铝烧结体可以具有比兆赫至千兆赫频段的损耗要低。;版权KIPO和WIPO 2010

著录项

  • 公开/公告号KR20100077201A

    专利类型

  • 公开/公告日2010-07-07

    原文格式PDF

  • 申请/专利权人 KYOCERA CORPORATION;

    申请/专利号KR20107010888

  • 申请日2008-11-28

  • 分类号C04B35/111;G02F1/13;

  • 国家 KR

  • 入库时间 2022-08-21 18:32:19

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